Abstract
A source of metal atoms accompanied by fast gas atoms has been developed and studied. The fast particles are produced due to charge exchange collisions of ions accelerated by potential difference between a plasma emitter inside the source and an emissive grid. The metal atoms are produced due to sputtering a target placed at the hollow cathode bottom by ions with energy up to 3 keV from the plasma emitter. Sputtered atoms cross the emitter and the grid, together with accelerated ions enter the chamber and deposit on the products. Two different discharge modes can be used to produce the plasma emitter and bombard the growing nitride coating interruptedly by atoms and molecules with energy variable from 10 to 300 eV.
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