Abstract
Experimental study of a fast argon atom beam source is carried out and the study results are presented. The source comprises a 90-mm deep and 210-mm in diameter hollow cathode as well as a flat emission grid, both electrodes made of titanium. The study revealed main factors, which influence the zone diameter of homogeneous substrate etching by a broad beam of fast argon atoms, produced as a result of charge exchange collisions of ions, accelerated between a plasma emitter inside the hollow cathode and a secondary plasma in the working vacuum chamber, the plasmas being separated from each other with the grid. It is shown that at a distance from the grid, exceeding the resonant charge exchange length up to 4 times, elastic collisions have no appreciable impact on the spatial distribution of the etching rate in the vacuum chamber. The homogeneous etching zone diameter is mainly influenced by angular characteristics of accelerated particles in the grid plane. At a constant beam power up to 3–5 kW the diameter is rising with a decrease of their energy and with a corresponding increase of the beam current.
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