Deposition of Tungsten-Doped V2O5 Thin Films on Non-Alkali Glass Substrate by RF Magnetron Sputtering for Thermal Insulation

Abstract

The thermal insulation function of tungsten-doped vanadium dioxide (V2O5) thin films deposited on non-alkali glass substrate using RF magnetron sputtering was analyzed in this study. Grinded hot-dry V2O5 and tungsten powders, mixed in weight ratio of 98.1:1.9 or 97:3, were pressed at 800 psi for 10 min. These compounds were sintered at 550 or 600 °C for 8 hours, in oxygen gas environments (10 sccm and 0 sccm), to several W-doped V2O5 targets. The surface morphologies of these targets were analyzed by a SEM, and the crystal structure was characterized by a XRD. The experimental studies with reference to the thermal insulation property of V2O5 were conducted under various duration of deposition, substrate temperatures, rf powers and duration of annealing time. The influence of these factors was investigated using the Taguchi method, an orthogonal array L8. The results show that the targets contain a more homogenous structure and a larger grain size with higher oxygen gas flow rate. With a deposition-parameter combination of 60 min (duration of deposition), 300°C (substrate temperature), 150 W (rf power) and 60 min (duration of annealing time), the optimal thermal insulation temperature, 19.3°C, was observed.