Abstract
SiO2 films were deposited using both atmospheric glow plasma chemical deposition (APG-CVD) and spin coating as hard coating agents for their abrasion resistance. Tetraethoxysilane (TEOS) was used as the precursor. We formed films by spin coating on surfaces over APG-CVD as adhesive interlayer, and were able to achieve a hard deposited film without any cracks.
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