Abstract
TiO2 films are deposited on glass substrate in O2/Ar gas mixtures by facing target planar magnetron (FT-PM) sputtering, and the effects of the sputtering system on the crystal phases and axis orientation of TiO2 films are investigated for as-deposited films. Deposition is carried out by two systems: In the first system the opposing magnets have opposite polarites of internal permanent magnets in each target holder; this leads to confinement of the electrons therefore weak electron bombardment on the substrate. The result is poor grain growth with low quality anatase films with poor photocatalytic activity. In the second system the opposing magnets have the same polarities each other; the electron bombardment becomes strong and grain growth is enhanced. The results indicate a high quality anatase film with very good photocatalytic activity. [DOI: 10.1380/ejssnt.2009.290]
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