Deposition of phase pure nickel sulfide thin films from bis(O-alkylxanthato)–nickel(II) complexes by the aerosol assisted chemical vapour deposition (AACVD) method

Abstract

Bis(O-alkylxanthato)nickel(II) complexes (alkyl=hexyl and octyl) have been synthesised and their X-ray single crystal structures determined. Nickel sulfide thin films were deposited from both complexes at different deposition temperatures by the aerosol assisted chemical vapour deposition (AACVD) method. Phase pure rhombohedral NiS and mixture of rhombohedral NiS (millerites) and Ni17S18 were deposited onto the glass and silicon substrates at temperatures between 250 and 400°C. SEM images show that the films are based on irregular grains, nanodendrites and feather like morphologies.