Deposition of LaMnO 3 buffer layer on IBAD-MgO template by reactive DC sputtering

Abstract

The deposition conditions of LaMnO 3 (LMO) buffer layer on Ion Beam Assisted Deposition (IBAD)-MgO template by reactive DC sputtering were investigated. We developed a specially designed chamber for reactive DC magnetron sputtering. The deposition chamber was composed of two sputtering guns with the mixed metallic target of La (50 at%) + Mn (50 at%), halogen lamp heater, QCM (Quartz Crystal Microbalance), RGA (Residual Gas Analyzer) and reel to reel tape moving system. We investigated the effect of oxygen flow rate on the deposition rate of LMO layer. We found that there was an optimal range of oxygen flow rate to have the desired layer. Above the range, the deposition rate decreased sharply and plasma was unstable. Below the range, the deposited layer was partially metallic. We investigated the effect of substrate temperature on the texturing of LMO layer. The texturing of LMO layer was improved by increasing the substrate temperature. We investigated the effect of deposition rate on the texturing of LMO layer. The LMO layer has a good texture in the deposition rate range of 0.07–0.21 nm/s. We confirmed that deposition rate had little effect on the texturing of LMO layer in the deposition rate range. Sm 1Ba 2Cu 3O 7− d superconducting layer was deposited on the LMO(reactive)/IBAD-MgO template. I c and J c were 81.6 A and 1 MA/cm 2. This means that LMO layer deposited by reactive DC sputtering shows a good performance in superconductor coated conductor.