Abstract
RF magnetron sputtering with an auxiliary permanent magnet was applied for the deposition of TiO2 films. An auxiliary magnet was installed under a grounded electrode and the magnetic field strength was intensified in the whole discharge space. The film prepared by this sputtering apparatus showed a high value of the refractive index equal to that of bulk TiO2 crystal. The results of several diagnostic techniques showed characteristic changes in the discharge structure. It was shown that a high current of substrate-incident ions brings about growth of high-quality TiO2 films.
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