Deposition of CuO thin film prepared by DC reactive magnetron sputtering

Abstract

In this paper, the effect of oxygen flow rate on the physical microstructural, morphological and optical property of copper oxide (CuO) thin films have been reported. The CuO thin films were prepared by reactive magnetron sputtering without an external heating process. The film crystallization, morphological and surface roughness were characterized by the grazing-incident X-ray diffraction (GIXRD) and field-emission scanning electron microscope (FE-SEM) respectively. The optical transparent of the prepared samples were determined by UV-Vis-NIR spectrophotometer. The results shown that the deposition rate of the films was decreased with increasing in oxygen flow rate. The surface roughness was significantly affected by the change in oxygen flow rate. The results shown that the CuO thin films fabricated at 20 sccm-oxygen flow rate exhibited good crystal structure and transparent.