Abstract
Carbon rods of battery were utilized as a target in a plasma sputtering deposition of a carbon thin film. The rods were taken from unused battery waste containing some impurities. This study was intended to investigate the effect of the impurities on the resulted thin film. Furthermore, this work aimed to study the utilization of an unconventional sputtering technique to deposit the carbon film on glass substrates. A low-frequency plasma generator of 40 kHz was used to power the sputtering reactor. The plasma was generated from an Argon gas in a medium vacuum pressure. Two deposition parameters studied in this work were plasma power varied from 220 watts to 360 watts and substrate temperature varied from 25 °C to 202 °C. The carbon target in this research was also functioned as an electrode in the sputtering system. The deposition process was carried out for 1 hour to produce a reasonably thick carbon thin film. The resulted films were characterized using a Fourier Transform Infrared (FTIR) spectroscopy. The FTIR spectra showed a distinct peak around 1200 cm-1 and 1600-1700cm-1 related to the C-C and C = C vibration respectively. The relatively broad peak consisted of a doublet indicating a complex structure of the carbon film, presumably an amorphous carbon film. It was proven that impure carbon could be used as the target and successfully deposited on the glass substrate.
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