Abstract
By generating closed-loop electron E × B drift over the front and back surface of a band magnetron cathode, a uniform magnetron plasma can be formed over the front surface. Here, we attempted to generate a uniform supermagnetron plasma under a stationary magnetic field by situating two such band magnetron cathodes face-to-face in parallel. Performing uniform supermagnetron plasma chemical vapor deposition (CVD) with tetraethylorthosilicate (TEOS)/O2 CVD, SiO2 films with good uniformity (±5%) at the central region of the cathode could be achieved under a stationary magnetic field of about 160 G. Using this supermagnetron plasma CVD apparatus, a-CNx:H films were then deposited to investigate their characteristics using isobutane (i-C4H10)/N2 mixed gases. A relatively high deposition rate of about 100 nm/min was obtained. The a-CNx:H films obtained had a hardness of about 25 GPa, higher than that of glass (22 GPa).
Highlights
High-uniformity deposition of hydrogenated amorphous carbon nitride (a-CNx:H) films is essential for the fabrication of the high-reliability devices that depend on these films, such as opto-electronic and vacuum microelectronic devices, including light emission diodes and field electron emission devices [1,2,3,4,5,6,7]
By generating closed-loop electron E × B drift over the front and back surface of a magnetron cathode, i.e., a band magnetron cathode, uniform magnetron plasma can be formed over the front surface under a stationary magnetic field [10]
The uniformity of SiO2 films generated was investigated as a function of the distance of the stationary permanent magnet from the sample. This uniform supermagnetron plasma chemical vapor deposition (CVD) apparatus was used for the deposition of hard a-CNx:H films
Summary
High-uniformity deposition of hydrogenated amorphous carbon nitride (a-CNx:H) films is essential for the fabrication of the high-reliability devices that depend on these films, such as opto-electronic and vacuum microelectronic devices, including light emission diodes and field electron emission devices [1,2,3,4,5,6,7]. We attempted to generate a uniform supermagnetron plasma under a stationary magnetic field by situating two such band magnetron cathodes face-to-face in parallel. The uniformity of SiO2 films generated was investigated as a function of the distance of the stationary permanent magnet from the sample.
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