Abstract
Titanium nitride films were prepared on glass substrates by dc reactive magnetron sputtering from a titanium metal target in an Ar + N 2 mixed atmosphere. During deposition, the total pressure was varied from 2 × 10 −3 to 3 × 10 −2 mbar. The effects of the total pressure on the structural, optical and electrical properties of the films were studied using X-ray diffraction, scanning electron microscopy, reflectance spectra and resistivity measurements.
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