Dense plasma production and film deposition by new high-rate sputtering using an electric mirror

Abstract

Production of a dense plasma for new high-rate sputtering using an electric mirror has been achieved. The plasma, whose density is over 1012 cm−3, is generated by reciprocating an electron beam between two targets. Microwave excitation is detected in the dense plasma. Nonlinear interaction between the electron beam and the plasma plays an important role in dense plasma production. High deposition rates of over 3000 Å/min have been realized for Al, Mo, Fe, etc. Low-frequency instability, corresponding to E×B drift wave, also occurs in the plasma.