Abstract
An active region design based on InGaN / delta-InN quantum well (QW) with AlGaN interlayer (IL) and GaN barriers (delta-structure) is investigated for potential high-efficiency visible light emitters. Numerical simulations demonstrate a large wavelength redshift with a simultaneous increase of the electron-hole wavefunction overlap for the delta-structure as compared to the conventional InGaN QW with AlGaN IL and GaN barriers. Proof of concept experimental growths via the metalorganic chemical vapor deposition demonstrate the effect of the delta-InN insertion into the conventional InGaN-based QW.
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