Degradation of release layer on high aspect ratio mold by contact angle measurement

Abstract

Ultraviolet nanoimprint lithography (UV-NIL) is a powerful tool for nano-scale fabrication. In fact, we have previously reported the fabrication of a high-density and high-aspect-ratio (>15) nano-scale pattern and its effective transfer method. In that method, however, strong release force is required during the release step, thus, degradation of release coating layer occurs. To clarify the lifetime of the release agent, the current research measured the contact angles of both the mold and replicated pattern using high aspect ratio mold and flat (without pattern) mold. Results showed that the release coating layer was degraded when using high aspect ratio and large surface area mold compared to the flat mold, measured by release force and contact angles of replicated pattern. So we successfully established an accelerated durability test method to assess release properties on UV-NIL using high aspect ratio and large surface area mold.