Abstract
Degradation of amoxicillin (AMX) by nanolepidocrocite chips/H2O2/UV method as a new photo-Fenton like process was investigated and optimized by response surface methodology (RSM). The optimal conditions were initial AMX concentration of 10mgl−1 and initial H2O2 concentration of 60mgl−1 at pH of 2 under UV radiation for 120min. The general photo-Fenton process mechanism was applied to propose a new kinetic model for AMX degradation. According to this model, the reaction constant between AMX and OH was obtained 4.55×105M−1s−1. Also, nanolepidocrocite showed good catalytic activity even after four successive degradation cycles.
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