Abstract
ABSTRACTFour types of cause related defects in the formation of platinum silicide were examined by scanning Auger Microscopy (SAM). These are: “Dark Platinum”, a dark rough patch on the platinum silicide, “Aqua Regia Attack”, the apparent etch of the platinum silicide by the aqua regia used to remove pure Pt metal, “Spot Defects”, holes in the Pt-Si layer and Ti-W strip defects, the apparent defects left in the Pt-Si by the stripping of a Ti-W overlayer. Elemental Auger maps show that silicide formation was prevented, in the first three cases, by remaining oxide from a masking step. The fourth case was caused by a layer of titanium oxide overlying the Pt-Si.
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