Abstract
This study was focused on unraveling the close dependence of the structural, morphological, and thermoelectric properties of sputtered ZnO films on base pressure. The ZnO film deposited at an optimized base pressure of 5 × 10−6 torr exhibited the highest thermoelectric power factor of 374.6 μW/mK2, corresponding to an electrical conductivity of 265 S/cm and a Seebeck coefficient of −124 μV/K at 583 K. The obtained results revealed that the positive effect of base pressure on enhancing thermoelectric properties of ZnO films is attributed to point-defect modification, including zinc vacancies, singly-, and doubly-charged oxygen vacancies. Based on these results, we propose that defect engineering is a facile and effective approach for improving the thermoelectric behavior of ZnO films, even without doping by controlling the sputtering conditions.
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