Abstract
A Deep X-Ray Lithography (DXRL) beamline was just commissioned at ELETTRA in Trieste, the Italian third generation synchrotron light source whose features make it well adapted to the DXRL process. A general description of the beamline is given with an emphasis on the reduction of the effect of secondary emission using a high energy filter based on an horizontal beam-stop. Finally the first fabricated microstructures are presented.
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Schedule a callMore From: Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment
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