Decoupling of graphene from Ni(111) via formation of an interfacial NiO layer

Abstract

A combination of surface science techniques (STM, XPS, ARPES) and density-functional theory calculations was used to study the decoupling of graphene from Ni(111) by oxygen intercalation. The formation of an antiferromagnetic (AFM) NiO layer at the interface between graphene and the ferromagnetic (FM) Ni is found, where graphene protects the underlying AFM/FM sandwich system. It is found that graphene is fully decoupled in this system and strongly p-doped via charge transfer with a position of the Dirac point of (0.69±0.02) eV above the Fermi level. Our theoretical analysis confirms all experimental findings, addressing also the interface properties between graphene and AFM NiO.