DCEMS Study of Thin Stainless Steel Films Deposited by RF Sputtering of AISI316L

Abstract

Thin stainless steel films were prepared on SiO2/Si plate heated at 100°C and 400°C using AISI316L as target, by a RF magnetron Ar sputtering method. RF sputtered‐deposited films and the oxidized surface layers by post heating were characterized by depth selective conversion electron Mossbauer spectroscopy (DCEMS) using a He+5%CH4 gas proportional counter. The as‐deposited films consisted of magnetic phases, the magnetic orientation of which had a tendency to be perpendicular to the surface of the film. In the case of the deposited films at substrate temperature of 100°C, a small amount of Fe2O3 and ferritic stainless steel formed by post‐heating in air. A magnetic subcomponent and a austenite phase were formed in the films deposited at substrate temperature of 400°C. α‐Fe2O3 and magnetite formed easily on the top and middle layers of the films by post‐heating in air. The oxide states of the films deposited at different temperatures of substrate were clearly distinguished by post‐heating. Thus it was found by DCEMS that the structures of the deposited films were strongly affected by the preparation method and the temperature of the substrate.