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https://doi.org/10.1016/0040-6090(90)90518-i
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Cite Journal: Thin Solid Films |  Publication Date: Apr 1, 1990 |
 Citations: 2 |
The aim of this work is to study the influence of phosphorus concentration, annealing temperature and medium on the d.c. dielectric breakdown of CVD PSG films deposited in the SiH 4 -PH 3 -O 2 -N 2 system at atmospheric pressure and low temperature
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