Abstract
A new two-dimensional model of a GaAs FET is proposed. The model takes into account diffusion processes and Gunn-domain formation under the gate but it requires a very small computer time. The electric-field profiles under the gate, current-voltage characteristics, the dependences of the transconductance and gate-to-source capacitance on the drain voltage, and the dependences of a characteristic switching time and power-delay product on the device thickness are calculated. The results of the calculation agree well with the experimental data found earlier by other authors. The proposed model can be used for a computer-aided design of GaAs FET amplifiers and logic elements and also for a comparative study of GaAs and InP MESFET's.
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