Abstract
The effect of the gate doping level on the current gain H/sub FS/ of a bipolar-mode field-effect transistor (BMFET) in the range of high drain current densities is investigated. It is demonstrated that the gate doping level can be chosen to optimize the current gain without significantly compromising the other features of the device. The behavior of H/sub FS/ is fully justified in terms of the doping dependency of the various minority-carrier transport parameters of the gate. >
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