Abstract
There is considerable interest in the semiconductor industry regarding Cu pillar bumping for finer pitch flip chip and 3D packaging applications. A common Cu Pillar method of production incorporates a combined Cu plated post topped with a plated solder pillar cap, usually of a Sn or SnAg alloy. Compared with this, a unique method of Cu pillar bump production developed at FlipChip International, LLC (FCI) creates the solder cap by applying and reflowing a solder paste on top of the plated Cu post. This method of production offers several benefits; the most important include a broader solder alloy selection, better alloy control, and improved overall pillar height uniformity. FCI has qualified a wide range of Cu pillar bump sizes, heights and shapes including Cu pillar bumps for fine pitch applications as low as 35um pitch (NANOPillarTM). FCI's Cu pillar bump structures in overmolded SiP have passed JEDEC 22-A104C board level thermal cycle testing, JEDEC J-STD-20A MLS 3@260C, as well as other board level corrosion and shock testing. FCI has demonstrated capping Cu pillar bumps with a broad range of solder alloys tailored to specific application requirements.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callMore From: Additional Conferences (Device Packaging, HiTEC, HiTEN, and CICMT)
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
