Abstract
AbstractA glass‐based poly‐Si/SiO2/α‐Si multilayer film with high reflectivity across the whole visible band is realized and reported in this letter, which could be used in plasma display panels to improve their luminescent efficiency. All the layers are deposited by dc sputtering at room temperature. The poly‐Si layer is formed by Cu‐induced α‐Si crystallization with crystallization degree of ∼73% and crystal grain size of ∼48 nm. With alternating high refractive index of α‐Si and poly‐Si and low refractive index of SiO2, the total reflectivity is higher than 60% across most of the whole visible band and ∼80% within the 400–700 nm range.magnified image(© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
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