CsI: a high effective gamma coating for plasma display panels

Abstract

Reduction of the breakdown voltage in plasma panel discharge cells calls for electrode coatings with a high secondary-electron emission yield. MgO is most widely used in this field because of its high secondary-electron yield, which is primarily governed by ion-induced emission processes. To overcome the limits of ion-induced emission, opening an additional channel via photon-induced emission is a possible option. The present study shows that this is indeed feasible, with a photosensitive material showing a substantially higher effective secondary-electron emission coefficient γeff when compared to state-of-the-art MgO electrode films.