Abstract
The paper deals with investigation of Mo oxide and mixed W/Mo oxide films showing high electrochromic performance. Films are deposited on Si and conductive glass substrates using pyrolytical decomposition at 200 °C of Mo and W hexacarbonyls in Ar/O 2 atmosphere. The study is focused on structural transformation of the films in dependence on deposition and annealing process parameters. In case of conductive glass substrate (typical for electrochromic devices), the crystallization process in Mo oxide films is almost completed at 400 °C forming triclinic MoO 2.89 and orthorhombic MoO 3 crystalline phases. The structure of mixed W/Mo oxide films is triclinic crystalline phase of tungsten oxide matrix with Mo atoms as substitutes. Discussed are, as well, differences in the crystallization process for the same films, when the substrate is Si. All the films show electrochromic effect, the mixed W/Mo oxide films expressing stronger electrochromic effect with superior color efficiency and optical modulation.
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