Abstract

The crystallization mechanism of In2S3-doped Sb thin films is studied in detail to verify the potential application in phase change memory. Here, we observe directly that two different crystallization behaviors can exist in In–S–Sb thin layers by using aberration-corrected scanning transmission electron microscopy. The difference between Sb53.3(In2S3)46.7 and Sb30.9(In2S3)69.1 materials is induced by phase separation. The crystallization mechanism of the Sb53.3(In2S3)46.7 material is related to the formation of the nanocomposite structure with continuous precipitation of Sb nanocrystals. The crystallization characteristic of the Sb30.9(In2S3)69.1 material originates from the diffusion-driven In–S/In–S–Sb interface formation that acts as a “n–p” heterojunction, thereby resulting in the “depletion layer effect” and decreasing the carrier density to 7.42 × 1020 cm−3 at 280 °C. Sb30.9(In2S3)69.1 shows good bipolar-type resistance switching characteristics as the conventional Ge2Sb2Te5. This work provides clear experimental evidence to deepen the understanding of the crystallization mechanism for indium chalcogenides alloyed with Sb films, contributing to the improved control of the phase change behavior to establish high-performance multi-level nonvolatile memory and neuromorphic synaptic systems.

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