Abstract

Crystalline SrBi4Ti4O15 (SBTi) thin films were successfully deposited on amorphous fused silica substrates using rf sputtering technique. Homogeneous and crystallized films were obtained by optimizing the deposition and annealing conditions. The structural, morphological and optical properties of the films were investigated. As deposited films are amorphous in nature but crystallized on annealing at 600°C. AFM reveals the fine grain morphology on annealing. The refractive index and optical band gap of the films are ranged between 1.7-2 and 3.4 - 3.15eV respectively.

Full Text

Published Version

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.