Abstract
Nanoimprint lithography (NIL) is a simple process for fabricating nanostructure devices. There are many factors in nanoimprinting such as nanoimprint pressure, an antisticking layer, temperature, and the viscosity of resin. Although these factors affect the imprinted pattern, the nanoimprint mechanism has not been resolved. The flow behavior during nanoimprinting is important for investigating the nanoimprint mechanism. We propose a cross-sectional observation method for filling a nm-scale pattern with nanoimprint resins after nanoimprinting using scanning electron microscopy (SEM). A polyvinyl alcohol (PVA), which is soluble in water, was used in this observation. We demonstrated the cross-sectional observation of UV-, thermal-, and room temperature-nanoimprint resins using the proposed method.
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