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Open Accesshttps://doi.org/10.1021/acsaelm.2c00018
Copy DOI Journal: ACS Applied Electronic Materials |  Publication Date: Apr 12, 2022 |
 Citations: 2 |  License type: other-oa |
Affiliation: Interuniversity Center of Materials Research and Engineering, National Polytechnic Institute of Toulouse, Université Toulouse III - Paul Sabatier, French National Centre for Scientific Research, Laboratoire de Génie Chimique, Université de Toulouse, Conditions Extrêmes et Matériaux Haute Température et Irradiation, Université de Pau et des Pays de l'Adour, Institut des Sciences Analytiques et de Physico-Chimie pour l'Environnement et les MatériauxCritical Level of Nitrogen Incorporation in Silicon Oxynitride Films: Transition of Structure and Properties, toward Enhanced Anticorrosion Performance
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