Critical absorbed dose of resinous adhesive material towards non-destructive chemical-state analysis using soft X-rays

Abstract

The local electronic state of the N,N,N',N'-tetraglycidyl-4,4′-diaminodiphenylmethane epoxy resin cured with 4,4′-diaminodiphenylsulfone (TGDDM-DDS), one of model adhesive materials, was investigated by the O K-edge X-ray absorption spectroscopy (XAS) and X-ray emission spectroscopy (XES). The total-electron-yield XAS spectra for TGDDM-DDS as a function of the X-ray dose exhibit the exponential-like decrease in the curing-derived pre-edge intensity due to the radiation damage. The quantitative analysis on the pre-edge intensity with respect to the X-ray dose enables the determination of the critical absorbed dose for the chemical change on TGDDM-DDS as 3.83 ± 0.01 MGy at 300 K. By using resonant XES with the well-focused X-ray beam, we found that (i) the charged-particle equilibrium exists for the soft X-rays in the range of at least 0.001–0.847 mm2 beam spot and that (ii) the half of the critical absorbed dose can be regarded as the limit indicator for the non-destructive chemical-state characterization on resinous adhesive materials and interfaces using soft X-rays.