Abstract
We present a novel method for creating damage-free ferroelectric nanostructureswith a focused ion beam milling machine. Using a standard e-beam photoresistfollowed by a dilute acid wash, nanostructures ranging in size from1 µm down to 250 nm were created in a 90 nm thick lead zirconate titanate (PZT) wafer.Transmission electron microscopy and piezoresponse force microscopy (PFM)confirmed that the surfaces of the nanostructures remained damage free duringfabrication, and showed no gallium implantation, and that there was no degradation offerroelectric properties. In fact DC strain loops, obtained using PFM, demonstratedthat the nanostructures have a higher piezoresponse than unmilled films. As thesamples did not have any top hard mask, the method presented is unique as itallows for imaging of the top surface to understand edge effects in well-definednanostructures. In addition, as no post-mill annealing was necessary, it facilitatesinvestigation of nanoscale domain mechanisms without process-induced artefacts.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
