Abstract
Absolute cross-sections for dissociative electron attachment (DEA) to the typical focused electron beam induced processing (FEBIP) precursor cobalt tricarbonyl nitrosyl are reported. Nanostructures written by FEBIP can potentially be smeared and contaminated by back-scattered and secondary low-energy electrons. In their Communication on page 9475 ff. Š. Matejčík, O. Ingólfsson, and co-workers discuss the role of DEA to metal–organic compounds in FEBIP.
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