Abstract
This contribution is dealing with experimental and computational evaluation of the deposition baffle that is transparent to radio frequency (RF) magnetic fields generated by an external antenna in an inductively coupled plasma (ICP) source but opaque to the deposition of the metal onto a dielectric wall in ionized physical vapor deposition (IPVD) system. Various engineering aspects related to the deposition baffle are discussed. Among the many requirements focus is on specific structure of the slots and analysis to minimize deposition on the baffle (we used a string model for simulating the profile evolution) and deposition through the DB on dielectric components of the ICP source. Transparency of the baffle to RF magnetic fields is computed using a three-dimensional (3D) electromagnetic field solver. A simple two-dimensional sheath model is used to understand plasma interactions with the DB slot structure. Performance and possible failure of device are briefly discussed.
Highlights
Many inductively coupled plasma (ICP) sources require a protecting shield from the plasma
This contribution is dealing with experimental and computational evaluation of the deposition baffle that is transparent to radio frequency (RF) magnetic fields generated by an external antenna in an inductively coupled plasma (ICP) source but opaque to the deposition of the metal onto a dielectric wall in ionized physical vapor deposition (IPVD) system
Various engineering aspects related to the deposition baffle are discussed
Summary
Many ICP sources require a protecting shield from the plasma. Typical example is an ionized physical vapor deposition (IPVD) which is used for metallization process in IC fabrication. The high-density plasma generated by an ICP source provides the high-density ionized metal fluxes that are important for high-aspect ratio feature metallization and seed layer deposition in IC fabrication. We will focus on the physics and engineering aspects of an RF transparent baffle but opaque to deposition in experimental IPVD system [6, 7] with an external ICP antenna.
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