Abstract
A plasma focus system composed of a pair of counter-facing coaxial guns was proposed as a long-pulse and/or repetitive high energy density plasma source. We applied Li as the source of plasma for improvement of the conversion efficiency, the spectral purity, and the repetition capability. For operation of the system with ideal counter-facing plasma focus mode, we changed the system from simple coaxial geometry to a multi-channel configuration. We applied a laser trigger to make synchronous multi-channel discharges with low jitter. The results indicated that the configuration is promising to make a high energy density plasma with high spectral efficiency.
Highlights
Radiation from high-energy-density plasma is attracting our attention as an Extreme UltraViolet (EUV) light source for the generation semiconductor process
Schemes of the plasma light source are classified as Laser Produced Plasma (LPP) and Discharge Produced Plasma (DPP)
Both high average power and high conversion efficiency are needed for a practical EUV light source
Summary
Radiation from high-energy-density plasma is attracting our attention as an Extreme UltraViolet (EUV) light source for the generation semiconductor process. Schemes of the plasma light source are classified as Laser Produced Plasma (LPP) and Discharge Produced Plasma (DPP). Both high average power and high conversion efficiency are needed for a practical EUV light source. We should improve energy conversion efficiency; that is the ratio of output EUV energy to input electric energy. To improve the energy conversion efficiency, we would like to extend the radiative time of source plasma. The plasma focus system has a possibility to prolong the life time of EUV plasma more than second. By using the counter-facing plasma focus system and lithium source, we aim to improve the energy conversion efficiency, spectral efficiency and repetition capability [3, 4]
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