Abstract
In this study we investigated the influence of cobalt thickness (from 50nm to 10nm) on the kinetics and texture of CoSi2 layers. In-situ X-ray diffraction measurements were performed during isothermal annealing to determine CoSi2 kinetics as explained in a previous publication. Decreasing the initial cobalt thickness (50nm, 30nm, and 10nm) induces a slowdown of the formation rate, especially for the 10nm Co layer. A model based on CoSi2 nucleation is used to explain this phenomenon.
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