Abstract
TiN coatings were deposited by reactive sputtering on Armco iron, AISI 430 and AISI 304 substrates. The electrochemical behaviour of the samples was investigated using d.c. and a.c. electrochemical techniques in H 2SO 4 and NaCl solutions. Scanning electron microscopy was used to study the microstructure of the TiN coating in cross-section. The electrochemical tests show that the corrosion resistance of these materials is linked to the presence of different defects (pinholes, pores, etc.). An attempt was made to improve the corrosion resistance, first by modifying the sputtering conditions and secondly by the pre-sputtering of a pure titanium underlayer. The effects of these different methods are discussed.
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