Abstract
An attempt has been made to improve the corrosion resistance of titanium nitride films by the deposition of a pure titanium interlayer. Various TiN coatings were deposited by reactive sputtering on Armco iron and AISI 304L substrates. The electrochemical behaviour of the samples, in H 2SO 4 and NaCl solutions, was investigated using polarization curves and impedance spectroscopy. Glancing angle X-ray diffraction was used to study the structure of the various deposits. The electrochemical tests show that the corrosion resistance of these materials is linked to the presence of different types of defects and always increased by a pure titanium interlayer. The effects of this underlayer are discussed.
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