Abstract
Amorphous TiNi thin films were fabricated by high (MeV) energy ion beam mixing of alternating thin films of Ti and Ni deposited on Ni substrates. The corrosion resistance of these layers was studied in 1 M HNO 3 solution using potentiodynamic polarization technique. Results indicate a significantly improved corrosion behavior for ion beam mixed TiNi film compared to as deposited film as well as Ni substrate.
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