Abstract
HfO2 thin films were evaporated with ion beam assistance to achieve dense, homogeneous, stoichiometric and low-stress films. The ion beam energy were related to the optical and structural properties of the film. The absorption coefficient and the refractive index were measured by spectrophotometric technique while the microstructure has been studied by means of x-ray diffraction and atomic force microscopy. The correlation between the structure, optical properties and laser damage threshold were analyzed. The results suggest the HfO2 structure and laser damage properties are closely related to the momentum transfer process during film deposition.
Published Version
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