Abstract
In the present work we have reported the results of investigations on local structures of e-beam evaporated (HfO2–SiO2) composite thin films by synchrotron based extended x-ray absorption fine structure measurements. It has been observed that for the composite film with 10% SiO2 content, both Hf–O and Hf–Hf bond lengths are less than their values in pure HfO2 film. However the bond lengths subsequently increase to higher values as the SiO2 content in the composite films is increased further. It has also been observed that at the same composition of 10% SiO2 content, the films have smallest grain sizes (as obtained from atomic force microscopy measurements) and highest refractive index (as obtained from spectroscopic ellipsometry (SE) measurements) which suggests that the e-beam evaporated HfO2–SiO2 composite films with 10% SiO2 content leads to the most compact amorphous thin film structure.
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