Abstract
The abstract in [1] is incorrect. The word “photograph” was used in error rather than the more correct, “photo.” The abstract should read: In this paper, the evolution of various lithographic processes aimed at fabricating robust tantalum nitride (TaN) resistors in GaAs-based BiFET and BiHEMT technologies are discussed in detail. Such approaches include the common image reverse photo process (via amine poisoning) using a positive tone resist, the use of a chemically amplified negative tone resist, and also straight patterning of a positive tone resist. The aforementioned approaches were found to have their own unique challenges as it applied to printing robust TaN-based resistors approaching nearly a micron in width which is needed for high density mixed signal designs. We will explore many of these challenges in detail for the various lithography schemes.
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