Abstract
A high-resolution aberration-corrected photoemission electron microscope (PEEM3) will be installed on an undulator beamline at the Advanced Light Source at the Lawrence Berkeley National Laboratory. The aim of this instrument is to provide a substantial flux and resolution improvement by employing an electron mirror for correcting both the third-order spherical aberration and the primary chromatic aberration. In order to utilize this concept of correction, a beam separator is a prerequisite. Crucial to achieving a resolution of 5nm for the high-resolution mode, and a 16-fold increase in throughput at the same resolution as its predecessor, PEEM2, specified as 20nm at 2% transmission, for the high flux mode is the double-symmetric design of the beam separator, which eliminates all the second-order geometric aberrations. Nonetheless, substantial tuning capabilities must be incorporated into the PEEM3 design to compensate for both systematic and random errors. In this article, we investigate how to correct for nonsystematic imperfections and for systematic uncertainties in the accuracy of the magnetic fields and focus on how degradation of the resolution and the field of view can be minimized. Finally, we outline a tentative correction strategy for PEEM3.
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