Abstract
A new fabrication technique of copied holograms on PVC sheets using the master hologram on an amorphous chalcogenide semiconductor film (As 10Se 67.5Ge 22.5) is described. We studied experimentally the holographic characteristics of the master hologram formed by chemical etching of the amorphous film and the copied hologram. The quality of the reconstructed images from the copied holograms was as good as that from the master holograms. Typical values of diffraction efficiencies of copied and master holograms were about 1% and 5%, respectively.
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