Abstract
We produced nanopits on a highly oriented pyrolytic graphite substrate arranged in a given pattern with a combination of focused ion beam (FIB) irradiation and an oxidation process. The FIB irradiation was carried out using a dedicated FIB nanofabrication tool [J. Gierak et al., Appl. Phys. A: Mater. Sci. Process. A80, 187 (2005)]. After oxidation of the sample surface, defects produced by single ions were imaged as one monolayer deep nanopits with scanning tunneling microscopy. The penetration depth of the ions could be measured by oxidation of the defective volume produced on points irradiated with high ion doses. An array of well separated nanopits with a periodicity of 50nm could be produced.
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