Controlled Dopant Distribution and Higher Doping Efficiencies by Surface-Functionalized Atomic Layer Deposition

Abstract

Reversible surface functionalization allows control of the precursor saturation coverage and growth per cycle in atomic layer deposition. Functionalizing the ZnO surface with alkyl alcohols, we achieve 2× higher doping efficiencies in Al-doped ZnO compared to conventional atomic layer deposition because of the more efficient dopant distribution in the ZnO host