Abstract
Colloidal crystal films have been fabricated on silicon substrates using a flow-controlled vertical deposition (FCVD) method. Scanning electron microscopy shows that large areas of the colloidal crystal films can exhibit regular square arrangement or related 1×n superstructure induced by the surface relaxation of colloidal spheres. They are shown to be the (100) facing crystals of face centred cubic (FCC) structure. Their formation is related to meniscus bending at the edge of the wafer, which can be controlled by varying the width of the substrate or the wetting properties of the backing substrate. This (100) surface-oriented colloidal crystal could be used as a template to fabricate square arrangements of nanopore and nanodot arrays.
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