Abstract
TiN(5 nm)[CoPt(4 nm)/TiN(x nm)]5 multilayer films (x = 1, 2, 4, 6, 8, 10, 14) have been deposited on glass substrates by dc magnetron sputtering, and a L10-CoPt structure with perpendicular magnetic anisotropy (PMA) has been obtained after annealing at 700 and 800 °C. It is found that changing the TiN layer thickness and annealing temperature significantly affects the ordering degree and magnetic anisotropy energy of L10-CoPt/TiN multilayer films. To obtain the maximum value of the ordering degree and magnetic anisotropy energy, the optimum thickness of the TiN layer is around 4 and 8 nm, with an annealing temperature of 700 and 800 °C, respectively. Structural characterization results have shown that the thickness of the TiN layer greatly affects the interface structure between CoPt and TiN layers. When TiN layer thickness is below 2 nm, it tends to be discontinuous after annealing, which results in the coalescence of the adjacent CoPt layers. When TiN layer thickness is above 8 nm, the interface roughness becomes larger. In such cases, the preferred orientation, ordering degree of the L10 structure and the PMA of the films will be impaired.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.